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1. Identity statement
Reference TypeConference Paper (Conference Proceedings)
Sitemtc-m16.sid.inpe.br
Holder Codeisadg {BR SPINPE} ibi 8JMKD3MGPCW/3DT298S
Repositorysid.inpe.br/marciana/2004/01.16.11.56.40
Last Update2004:03.29.03.00.00 (UTC) administrator
Metadata Repositorysid.inpe.br/marciana/2004/01.16.11.56.41
Metadata Last Update2018:06.05.01.20.48 (UTC) administrator
Secondary KeyINPE-10496-PRE/5973
Citation KeyVieiraNono:2003:ChTiNi
TitleCharacterization of titanium nitride thin films deposited by cathodic arc plasma technique on (AISI D6) tool steel
FormatCD-ROM
Year2003
Access Date2024, May 19
Secondary TypePRE CI
Number of Files1
Size770 KiB
2. Context
Author1 Vieira, Rogério de Almeida
2 Nono, Maria do Carmo de Andrade
Resume Identifier1
2 8JMKD3MGP5W/3C9JHRC
Group1 LAS-INPE-MCT-BR
Conference NameInternational Latin-American Conference on Powder Technology, 4 (PTECH 2003).
Conference LocationGuarujá
Date2003
PublisherFAPESP/CNPQ/FINEP/CAPES
Publisher CitySão Paulo
Pages139
Book TitleAnais
History (UTC)2018-06-05 01:20:48 :: administrator -> marciana :: 2003
3. Content and structure
Is the master or a copy?is the master
Content Stagecompleted
Transferable1
Content TypeExternal Contribution
KeywordsAISI D6 tool steel
TiN thin film
Cathodic arc technique
AbstractTiN thin film has been produced on the surface of AISI D6 tool steel by using a titanium interlayer. In this work, the morphology, the microstructure and interface depth profile of TiN films deposited at two substrate temperatures (220 graus C and 450 graus C) in the coating process are presented and discussed. The AISI D6 tool steel substrates were coated with titanium thin film as the underlayer and with TiN thin film as the top layer. They were deposited by conventional cathodic arc process. The surfaces of TiN films were observed by scanning electron microscope (SEM). The microstructure of these samples were analyzed by X-ray diffraction (XRD). The influence of the substrate temperature on the TiN film-Ti film-AISI D6 interface region were investigated by energy dispersive spectrometry (EDS) and its cross section were observed using backscattered electron image (BEI). The results showed that TiN films deposited in 220 grausC formed a film of strongly (111) preferred orientation, while in 450oC formed a film of (111) and (220) preferred orientation. The thickness of the TiN films increased with increasing substrate temperature. The results show that the interface region of the TiN film-Ti film-AISI D6 substrate system was significantly improved when higher substrate temperature during deposition is used.
AreaFISMAT
Arrangementurlib.net > BDMCI > Fonds > Produção anterior à 2021 > LABAS > Characterization of titanium...
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4. Conditions of access and use
data URLhttp://urlib.net/ibi/sid.inpe.br/marciana/2004/01.16.11.56.40
zipped data URLhttp://urlib.net/zip/sid.inpe.br/marciana/2004/01.16.11.56.40
Languageen
Target FileVieira1.pdf
User Groupadministrator
Visibilityshown
Copy HolderSID/SCD
5. Allied materials
Next Higher Units8JMKD3MGPCW/3ESR3H2
Citing Item Listsid.inpe.br/mtc-m21/2012/07.13.14.55.40 1
Host Collectionsid.inpe.br/banon/2003/08.15.17.40
6. Notes
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7. Description control
e-Mail (login)marciana
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